New method to remove dust on solar panels

Source: Science Daily

Particle removal increased from 41% on hydrophilic smooth Si wafers to 98% on superhydrophobic Si-based nanotextured surfaces. The researchers confirmed these results by measuring the adhesion of a micron-sized particle to the flat and nanotextured substrate using an atomic force microscope. They found that the adhesion in water is reduced by a factor of 30.